Recent Plasma Processing Technology. Control of Surface Reaction in Plasma Enhanced CVD.
نویسندگان
چکیده
منابع مشابه
Low-pressure CVD and Plasma- Enhanced CVD
LPCVD is a process used in the manufacturing of the deposition of thin films on semiconductors usually ranging from a few nanometers to many micrometers. LPCVD is used to deposit a wide range of possible film compositions with good conformal step coverage. These films include a variety of materials including polysilicon for gate contacts, thick oxides used for isolation, doped oxides for global...
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ژورنال
عنوان ژورنال: Journal of the Japan Society for Precision Engineering
سال: 1994
ISSN: 1882-675X,0912-0289
DOI: 10.2493/jjspe.60.1571